High-Precision Vacuum
Solutions for
Semiconductor
Manufacturing
Custom-engineered high-vacuum chambers and components that meet the most demanding semiconductor process requirements.
Addressing Critical Challenges in Semiconductor Manufacturing
The semiconductor industry is currently facing many problems that need to be solved
Modern semiconductor processes have increasingly higher requirements for chamber vacuum (<1×10^-7 Pa), and traditional manufacturing processes are difficult to meet the needs of advanced processes.
-
Laiku has achieved a breakthrough in ultra-high vacuum
(< 10^-7Pa ) technology, with a leakage rate (<1.0×10^-13 Pa·m³/s).
Precision control and deformation issues in large-size cavity processing. Poor deformation control will seriously affect the performance and yield of semiconductor equipment.
- Laiku has mastered high-precision deformation control technology, and the deformation tolerance is controlled within (±0.05mm/m).
Semiconductor processes have strict requirements on component cleanliness, and even a trace of contamination can lead to a decrease in chip yield
- Equipped with constant temperature and humidity welding rooms, Class 10,000, Class 1000 and Class 100 clean rooms, providing a full-process clean solution from processing to clean assembly.
The complex cavity structures in modern semiconductor devices require high-precision machining, especially for aluminum alloy parts that are difficult to weld.
- Provides a variety of advanced welding processes such as TIG welding and friction stir welding (FSW), especially suitable for complex geometries and high-quality joints in semiconductor device manufacturing.
The instability of the global supply chain has led to extended delivery times and unstable quality of core components of semiconductor equipment
- Providing complete supply chain services from raw materials, machining, welding to surface treatment and clean assembly can help you save time and improve efficiency
Semiconductor technology is rapidly iterating, and equipment manufacturers need partners who can quickly respond to customized needs
- Laiku focuses on providing customized solutions and has a team of high-end technical talents who can provide customers with customized services from chambers to complete systems.
Precision-Engineered Solutions for Semiconductor Equipment Manufacturers
The product series we provide are widely used in lithography, ion implantation, thin film deposition, dry etching and other links.
Spherical stainless steel vacuum chamber
Cylindrical stainless steel vacuum chamber
Square stainless steel vacuum chamber
Large stainless steel chamber
Large aluminum alloy chamber
Large aluminum alloy chamber
CVD four major components
backing plate
Diffuser
Shadow Frame
Susceptor
Meet any technical requirements of your products
Our key technological breakthroughs can make your products even better!
Vacuum requirements for different semiconductor processes
- Photolithography process
- General photolithography: 10^-3 ~ 10^-5 Pa
- EUV lithography: 10^-7 ~ 10^-9 Pa
- Thin film deposition process
- Physical vapor deposition (PVD): 10^-4 ~ 10^-6 Pa
- Chemical vapor deposition (CVD): 10^-4 ~ 10^-7 Pa
- Atomic layer deposition (ALD): 10^-6 ~ 10^-8 Pa
- Etching process
- Reactive ion etching (RIE): 10^-4 ~ 10^-6 Pa
- Deep reactive ion etching (DRIE): 10^-5 ~ 10^-7 Pa
- Ion implantation process
- Basic vacuum degree: 10^-5 ~ 10^-7 Pa
Why do we pursue ultra-high vacuum?
Impurity control
10^-7 Pa vacuum can significantly reduce the contamination of residual gas molecules (such as water, oxygen, hydrocarbons) to the process
Surface cleanliness
Under ultra-high vacuum, the time it takes for a surface contamination monolayer to form can be extended from a few seconds in ordinary high vacuum to several hours.
Yield improvement
Providing the necessary clean environment for 7nm and below process nodes
Uniformity assurance
ensuring the accuracy and uniformity of processes such as thin film deposition and ion implantation
Challenges of Vacuum Chamber Welding
· Leak rate requirements
Usually the leakage rate is required to be lower than 1×10^-10 Pa·m³/s.
· Material outgassing
Special treatment is required to reduce the release of gas from the material.
· Weld quality
There must be no micropores or impurities to ensure long-term vacuum integrity.
The key significance of leak rate indicator in vacuum system
Leak rate is the most critical indicator to measure the sealing integrity of the vacuum system, which directly determines whether the system can reach and maintain the designed vacuum degree. For semiconductor process equipment, even a small leak may cause:
- The basic vacuum degree cannot meet the standard, affecting the purity control of subsequent process gases.
- Pollutants such as moisture and oxygen in the atmosphere continue to penetrate, interfering with the uniformity of film deposition.
- The formation of the surface adsorption layer is accelerated, reducing the interface quality and structural characteristics.
- The residual gas composition in the process chamber changes, affecting the ionization efficiency and energy distribution.
Ultra-high vacuum sealing technology
Through years of focused research and development, Leku has transformed the extremely low leakage rate control capability of <1.0×10^-13 Pa·m³/s into a core competitive advantage, and can provide you with truly “ultra-high vacuum grade” products that meet the stringent requirements of the most advanced semiconductor processes.
Integrate Class 10 clean technology into every manufacturing process to provide pure protection for your advanced processes
Class 10 clean environment control
- Particle concentration is less than 10/cubic foot (particles 0.5μm and larger)
- Real-time monitoring and automatic alarm system
- Precise temperature and humidity control (20±0.5℃, 45±2%RH)
Pollution-free manufacturing throughout the entire process
- Clean room partition management and airflow design
- Personnel training and strict operating procedures
- Dedicated purified gas delivery system
Trusted by Leading Semiconductor OEMs
Technical Specifications
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What Our Clients Say
Frequently Asked Questions
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Ready to Enhance Your Semiconductor Equipment Performance?
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